J.A. WOOLLAM CO. INC.

ALPHA-SE

EQUIPMENT, NAMELY ELLIPSOMETER BASED APPARATUS FOR MEASURING THICKNESS AND OPTICAL PROPERTIES OF SEMICONDUCTOR, DISK DRIVE, MAGNETIC DATA STORAGE MEDIA, OPTICAL DATA STORAGE MEDIA, THIN FILMS AND MULTIPLE LAYER FILMS ON SUBSTRATES AND COATINGS, AND COMPUTER PROGRAMS NECESSARY FOR CONTROLLING THE ELLIPSOMETER BASED APPARATUS AND FOR ANALYZING ACQUIRED ELLIPSOMETRIC DATA;SE;

AUTORETARDER

ELLIPSOMETERS, POLARIMETERS, AND REFLECTOMETERS WHICH UTILIZE ELECTROMAGNETIC RADIATION TO INVESTIGATE SAMPLE SYSTEMS;AUTO RETARDER;

E

ELLIPSOMETERS, POLARIMETERS AND SPECTROPHOTOMETERS WHICH UTILIZE ELECTROMAGNETIC RADIATION TO INVESTIGATE SAMPLES;

G-VASE

ellipsometer, polarimeter and reflectometer which utilize polarized electromagnetic radiation to investigate sample systems;G VASE;

G-VASE

G VASE;INVESTIGATING SAMPLES OF SUBSTRATES WITH AND WITHOUT SURFACE LAYERS BY USING ELLIPSOMETERS, POLARIMETERS AND REFLECTOMETERS WHICH UTILIZE ELECTROMAGNETIC RADIATION;

GENOSC

EQUIPMENT, NAMELY ELLIPSOMETER BASED APPARATUS FOR MEASURING THICKNESS AND OPTICAL PROPERTIES OF SEMICONDUCTOR, DISK DRIVE, MAGNETIC DATA STORAGE MEDIA, OPTICAL DATA STORAGE MEDIA, THIN FILMS AND MULTIPLE LAYER FILMS ON SUBSTRATES AND COATINGS, INCLUDING TEMPERATURE CAUSED EFFECTS, AND COMPUTER PROGRAMS NECESSARY FOR CONTROLING THE ELLIPSOMETER BASED APPARATUS AND FOR ANALYZING ACQUIRED ELLIPSOMETRIC DATA;

GENOSC-

EQUIPMENT, NAMELY ELLIPSOMETER BASED APPARATUS FOR MEASURING THICKNESS AND OPTICAL PROPERTIES OF SEMICONDUCTOR, DISK DRIVE, MAGNETIC DATA STORAGE MEDIA, OPTICAL DATA STORAGE MEDIA, THIN FILMS AND MULTIPLE LAYER FILMS ON SUBSTRATES AND COATINGS, INCLUDING TEMPERATURE CAUSED EFFECTS, AND COMPUTER PROGRAMS NECESSARY FOR CONTROLING THE ELLIPSOMETER BASED APPARATUS AND FOR ANALYZING ACQUIRED ELLIPSOMETRIC DATA;

GENOSC-GLOBAL FIT

EQUIPMENT, NAMELY ELLIPSOMETER BASED APPARATUS FOR MEASURING THICKNESS AND OPTICAL PROPERTIES OF SEMICONDUCTOR, DISK DRIVE, MAGNETIC DATA STORAGE MEDIA, OPTICAL DATA STORAGE MEDIA, THIN FILMS AND MULTIPLE LAYER FILMS ON SUBSTRATES AND COATINGS, INCLUDING TEMPERATURE CAUSED EFFECTS, AND COMPUTER PROGRAMS NECESSARY FOR CONTROLING THE ELLIPSOMETER BASED APPARATUS AND FOR ANALYZING ACQUIRED ELLIPSOMETRIC DATA;

GENOSC-PG

EQUIPMENT, NAMELY ELLIPSOMETER BASED APPARATUS FOR MEASURING THICKNESS AND OPTICAL PROPERTIES OF SEMICONDUCTOR, DISK DRIVE, MAGNETIC DATA STORAGE MEDIA, OPTICAL DATA STORAGE MEDIA, THIN FILMS AND MULTIPLE LAYER FILMS ON SUBSTRATES AND COATINGS, INCLUDING TEMPERATURE CAUSED EFFECTS, AND COMPUTER PROGRAMS NECESSARY FOR CONTROLING THE ELLIPSOMETER BASED APPARATUS AND FOR ANALYZING ACQUIRED ELLIPSOMETRIC DATA;

GENOSC-PREFIT

EQUIPMENT, NAMELY ELLIPSOMETER BASED APPARATUS FOR MEASURING THICKNESS AND OPTICAL PROPERTIES OF SEMICONDUCTOR, DISK DRIVE, MAGNETIC DATA STORAGE MEDIA, OPTICAL DATA STORAGE MEDIA, THIN FILMS AND MULTIPLE LAYER FILMS ON SUBSTRATES AND COATINGS, INCLUDING TEMPERATURE CAUSED EFFECTS, AND COMPUTER PROGRAMS NECESSARY FOR CONTROLING THE ELLIPSOMETER BASED APPARATUS AND FOR ANALYZING ACQUIRED ELLIPSOMETRIC DATA;

GLOBAL FIT

EQUIPMENT, NAMELY ELLIPSOMETER BASED APPARATUS FOR MEASURING THICKNESS AND OPTICAL PROPERTIES OF SEMICONDUCTOR, DISK DRIVE, MAGNETIC DATA STORAGE MEDIA, OPTICAL DATA STORAGE MEDIA, THIN FILMS AND MULTIPLE LAYER FILMS ON SUBSTRATES AND COATINGS, AND COMPUTER PROGRAMS NECESSARY FOR CONTROLING THE ELLIPSOMETER BASED APPARATUS AND FOR ANALYZING ACQUIRED ELLIPSOMETRIC DATA;

H-VASE

ELLIPSOMETER, POLARIMETER, AND REFLECTOMETERS WHICH UTILIZE ELECTROMAGNETIC RADIATION TO INVESTIGATE SAMPLE SYSTEMS;H VASE;

HEATCELL

IDENTIFY EQUIPMENT, NAMELY ELLIPSOMETER BASED APPARATUS FOR MEASURING THICKNESS AND OPTICAL PROPERTIES OF SEMICONDUCTOR, DISK DRIVE, MAGNETIC DATA STORAGE MEDIA, OPTICAL DATA STORAGE MEDIA, THIN FILMS AND MULTIPLE LAYER FILMS ON SUBSTRATES AND COATINGS, INCLUDING TEMPERATURE CAUSED EFFECTS, AND COMPUTER PROGRAMS NECESSARY FOR CONTROLLING THE ELLIPSOMETER BASED APPARATUS AND FOR ANALYZING ACQUIRED ELLIPSOMETRIC DATA;HEAT CELL;

HS-190

monochrometers such as utilized in ellipsometer, polarimeter, reflectometer and the like systems which utilize electromagnetic radiation to investigate sample systems;HS 190;

ISE

IDENTIFY EQUIPMENT, namely, ELLIPSOMETER BASED APPARATUS FOR MEASURING THICKNESS AND OPTICAL PROPERTIES OF SEMICONDUCTOR, DISK DRIVE, MAGNETIC DATA STORAGE MEDIA, OPTICAL DATA STORAGE MEDIA, THIN FILMS AND MULTIPLE LAYER FILMS ON SUBSTRATES AND COATINGS, AND COMPUTER PROGRAMS NECESSARY FOR CONTROLING THE ELLIPSOMETER BASED APPARATUS AND FOR ANALYZING ACQUIRED ELLIPSOMETRIC DATA;

JAWCO

Business consulting services for others in the field of ellipsometers, polarimeters and spectrophotometers which utilize electroomagnetic radiation to investigate samples;

M-44

ELLIPSOMETERS, POLARIMETERS, AND REFLECTOMETERS WHICH UTILIZE ELECTROMAGNETIC RADIATION TO INVESTIGATE SAMPLE SYSTEMS;

M-88

ELLIPSOMETERS, POLARIMETERS, AND REFLECTOMETERS WHICH UTILIZE ELECTROMAGNETIC RADIATION TO INVESTIGATE SAMPLE SYSTEMS;M 88;

MASE

EQUIPMENT, NAMELY ELLIPSOMETER BASED APPARATUS FOR MEASURING THICKNESS AND OPTICAL PROPERTIES OF SEMICONDUCTOR, DISK DRIVE, MAGNETIC DATA STORAGE MEDIA, OPTICAL DATA STORAGE MEDIA, THIN FILMS AND MULTIPLE LAYER FILMS ON SUBSTRATES AND COATINGS, INCLUDING TEMPERATURE CAUSED EFFECTS, AND COMPUTER PROGRAMS NECESSARY FOR CONTROLING THE ELLIPSOMETER BASED APPARATUS AND FOR ANALYZING ACQUIRED ELLIPSOMETRIC DATA;

TEMPRAMP

IDENTIFY EQUIPMENT, NAMELY ELLIPSOMETER BASED APPARATUS FOR MEASURING THICKNESS AND OPTICAL PROPERTIES OF SEMICONDUCTOR, DISK DRIVE, MAGNETIC DATA STORAGE MEDIA, OPTICAL DATA STORAGE MEDIA, THIN FILMS AND MULTIPLE LAYER FILMS ON SUBSTRATES AND COATINGS, INCLUDING TEMPERATURE CAUSED EFFECTS, AND COMPUTER PROGRAMS NECESSARY FOR CONTROLLING THE ELLIPSOMETER BASED APPARATUS AND FOR ANALYZING ACQUIRED ELLIPSOMETRIC DATA;TEMP RAMP;

TEMPRAMP-VASE

Equipment, namely ellipsometer based apparatus for measuring thickness and optical properties of semiconductor, disk drive, magnetic data storage media, optical data storage media, thin films and multiple layer films on substrates and coatings, and temperature caused effects, and computer programs necessary for controlling the ellipsometer based apparatus and for analyzing acquired ellipsometric data;TEMP RAMP-VASE;

V-VASE

ELLIPSOMETERS, POLARIMETERS, AND REFLECTOMETERS WHICH UTILIZE ELECTROMAGNETIC RADIATION TO INVESTIGATE SAMPLE SYSTEMS;V VASE;

VASEMANAGER

IDENTIFY EQUIPMENT, NAMELY ELLIPSOMETER BASED APPARATUS FOR MEASURING THICKNESS AND OPTICAL PROPERTIES OF SEMICONDUCTOR, DISK DRIVE, MAGNETIC STORAGE MEDIA, OPTICAL DATA STORAGE MEDIA, THIN FILMS AND MULTIPLE LAYER FILMS ON SUBSTRATES AND COATINGS, AND EFFECTS CAUSED BY TEMPERATURE CHANGES; AND COMPUTER PROGRAMS NECESSARY FOR CONTROLLING THE ELLIPSOMETER BASED APPARATUS FOR ANALYZING ACQUIRED ELLIPSOMETRIC DATA;VASE MANAGER;