ADVANCED TECHNOLOGY MATERIALS, INC.

ACCUDOSE

Equipment for measuring material concentration and for combining materials to form a controlled mixture for delivery at a predetermined concentration of one or more components therein, namely, an infrared radiation source, an infrared radiation detector, and signal processing electronic circuitry, all sold as a unit, for generating an output correlative of said predetermined concentration, for use in industrial processes;

ADVANCED TECHNOLOGY MATERIALS

chemical reagent supply, vaporization and delivery apparatus for carrying out chemical vapor deposition for manufacture of semiconductors and superconductors;technical support services, namely, adaptation, construction, installation, maintenance, and deinstallation of chemical reagent source, vaporization and delivery apparatus for chemical vapor deposition applications;chemicals, substrates, and coating for use in the manufacture of semiconductors and superconductors;ADVANCED TECHNOLOGY MATERIALS;

AEROGRADE

COATED FIBERS COMPRISING COATINGS OF CERAMICS, METALS, INTERMETALLIC COMPOUNDS, AND/OR GLASSES, ON FIBERS FORMED OF CARBON, GLASS, CERAMIC, AND/OR POLYMERS, FOR USE IN COMPOSITES, FILTERS AND ELECTRONIC WARFARE COUNTERMEASURES;AERO GRADE;

ATMI

Custom semiconductor manufacturing material treatment services;Apparatus and instruments for monitoring and control of manufacturing processes; encoded integrated circuit cards and encoded smart cards, containing programming used to facilitate interactive consumer transactions; non-destructive gas analyzers; silicon wafers and epitaxial thin films sold as a component of electrical/electronic substrates;Semiconductor manufacturing machines;Metallic containers for storing chemicals; manually operated metal inlet, outlet, and refill valves; manually operated metal manifolds for transferring chemicals; pipes and tubes of metal for transferring chemicals; metal chemical delivery cabinets for housing metal containers, valves, manifolds and pipes of metal; all for use in chemical delivery and refill canister systems;Construction, installation, maintenance, and deinstallation of manufacturing equipment;ADVANCED TECHNOLOGY MATERIALS INCORPORATED;Color is not claimed as a feature of the mark.;Providing product information by telecommunications interaction and in person in the field of advanced materials and chemical precursors and products thereof, namely, thin film materials, organometallic source reagent compounds, chemical mechanical polishing preparations, chemical vapor deposition equipment, and chemical reagent delivery systems for chemical vapor deposition, semiconductor and superconductor materials and chemical reagents, materials packaging, and semiconductor processing;Chemical reagents, namely, epitaxial thin film materials, organometallic source reagent compounds and complexes, and ion implantation materials, all for use in the electronics and semiconductor manufacturing industry; chemicals for use in chemical reagent delivery systems for use in the manufacture of semiconductors; processing gases for use in the manufacture of semiconductors, flat panel displays, compact discs and recording media; sub-atmospheric pressure gases for ion implantation and chemical vapor deposition; chemicals for treating hazardous gases in semiconductor applications; manufacturing chemicals for the tool hardening industry and for research and development laboratories, all for use in the manufacture of semiconductors; chemical reagents for use in the manufacture of semiconductors in the electronics and semiconductor manufacturing industry;Abatement apparatus, namely, scrubbers, oxidizers, concentrators, reactors, sorbers and incinerators, for the treatment of effluents from semiconductor manufacturing processes;Disposable bulk container liners.;Technical consultation and support services, namely, trouble-shooting, engineering design, maintenance, needs analysis, and assistance in product and process implementation, and cooperative technology development services, in the field of integrated circuits, electronic systems and subsystems, equipment and software for the non-destructive analysis of materials, equipment and software for monitoring fluids and fluid streams to determine the presence, characteristics and concentration of specific materials in such streams, analytical monitoring and process control equipment, and chemical analysis equipment;

BRIGHTBLACK

Carbon electrodes for energy storage;Metal gas supply containers containing a carbon adsorbent that stores adsorbed fluid and from which stored fluid is desorbed for dispensing from the container;BRIGHT BLACK;

CMPLICITY

Process equipment for coupling to semiconductor manufacturing machines and semiconductor wafer processing equipment, namely, dispensers for delivering metered or measured amounts of chemical mechanical polishing and planarization compositions and post-chemical mechanical polishing and planarization cleaning compositions to machines performing chemical mechanical polishing and planarization processes and machines performing post-chemical mechanical polishing and planarization processes in the manufacture of semiconductor and microelectronic products;Process equipment for coupling to semiconductor manufacturing machines and semiconductor wafer processing equipment, namely, mixing machines for blending, mixing and delivering chemicals and chemical mechanical polishing and planarization compositions to machines performing chemical mechanical polishing and planarization processes in the manufacture of semiconductor and microelectronic products; and mixing machines for blending, mixing, and delivering chemicals and post-chemical mechanical polishing and planarization cleaning compositions to machines performing post-chemical mechanical polishing and planarization processes in the manufacture of semiconductor and microelectronic products;Process equipment for coupling to semiconductor manufacturing machines and semiconductor wafer processing equipment, namely, metal fluid storage tanks for holding chemical mechanical polishing and planarization compositions, and for holding post-chemical mechanical polishing and planarization cleaning compositions, for machines performing chemical mechanical polishing and planarization processes and for machines performing post-chemical mechanical polishing and planarization processes in the manufacture of semiconductor and microelectronic products;Chemical mechanical polishing and planarization preparations for use in chemical mechanical polishing and planarization processes in the manufacture of semiconductor and microelectronic products;SIMPLICITY;Chemicals for use in chemical mechanical polishing and planarization processes in the manufacture of semiconductor and microelectronic products;Process equipment for coupling to semiconductor manufacturing machines and semiconductor wafer processing equipment, namely, plastic fluid storage tanks for holding chemical mechanical polishing and planarization compositions, and for holding post-chemical mechanical polishing and planarization cleaning compositions, for machines performing chemical mechanical polishing and planarization processes and for machines performing post-chemical mechanical polishing and planarization processes in the manufacture of semiconductor and microelectronic products;

EPIGRADE

EPI GRADE;CHEMICAL REAGENTS FOR USE IN THE ELECTRONICS AND AEROSPACE INDUSTRIES;FLUID PURIFICATION SYSTEMS;

LUNDY

electrically operated countermeasures dispensers and related controllers for use in dispensing chaff and flares; electro magnetic filters for dispenser systems; countermeasures for use in decoying radar frequency and infrared missiles;DC motors and servo motors and mechanical linkages for connecting said motors to aircraft controls;

LUNDY

electrically operated countermeasures dispensers and related controllers for use in dispensing chaff and flares; electro magnetic filters for dispenser systems; countermeasures for use in decoying radar frequency and infrared missiles;DC motors and servo motors and mechanical linkages for connecting said motors to aircraft controls;

NANOGRAV

piezoelectric chemical analysis equipment;

NOVALYZER

equipment and software for monitoring fluids and fluid streams to determine the presence, characteristics and concentration of specific components;

NOVASOURCE

processing gases for use in the manufacture of semiconductors, flat panel displays, compact discs, and recording media;

PERFORMA

Controlled decomposition/oxidation apparatus used for exhaust gas conditioning;Thermal/wet treatment units for controlled decomposition oxidation treatment of industrial exhaust gases;

PROACT

custom manufacturing of equipment, materials and process systems for manufacturing, testing, packaging and qualification of microelectronic products, semiconductors, flat-panel displays, integrated circuits, electronic systems and subsystems by others; recycling services for microelectronics manufacturing, namely, recycling of wafers previously used for monitoring of semiconductor manufacturing equipment and processes; technical consultation services relating to equipment, processes, materials and technology for manufacturing microelectronic products, semiconductors, flat-panel displays, integrated circuits, electronic systems and subsystems by others; consulting services related to manufacturing microelectronic products, semiconductors, flat-panel displays, integrated circuit displays, integrated circuits, electronic systems and subsystems by others;computer hardware and custom software installed in such computer hardware, for use in the manufacture, testing and qualification of microelectronic products, semiconductors, flat-panel displays, integrated circuits, electronic systems and subsystems; computer hardware and customer software installed in such computer hardware for monitoring and control applications in the manufacture, testing and qualification of microelectronic products, semiconductors, flat-panel displays, integrated circuits, electronic systems and subsystems; process and product monitors for sensing and output of sensed information to characterize the process and product, process and product analyzers for output of analytical information to characterize the process and product, and electrical and pneumatic controllers for use in manufacturing, testing and qualifying microelectronic products, semiconductors, flat-panel displays, integrated circuits, electronic systems and subsystems; process and product analyzers for non-destructively characterizing semiconductor materials and non-destructively monitoring semiconductor manufacturing processes; monitors for semiconductor manufacturing processes, namely, sensors and analyzers; substrates for microelectronic products, namely, wafers, and base structures including wafers and epitaxial thin films; equipment for delivering chemicals, and chemical refill equipment, namely, dispensers, electrical and pneumatic flow controllers, and valves, for use in the manufacture of microelectronic products, semiconductors, digital storage media, flat-panel displays, and integrated circuits; equipment for storing and dispensing industrial solids, liquids and gases, namely, dispensers, electrical and pneumatic flow controllers, and electrical valves; liquid chemical detectors, namely, sensors for detection of liquid chemicals, chemical liquid level detectors, colorimetric detectors of chemical liquids, and endpoint detectors for determining exhaustion of liquid chemical in dispensing operations, flow circuitry, and liquid chemical dispensers for pressure-mediated dispensing of liquid chemicals; radio frequency identification systems comprised of readers, tags and software for identifying and tracking chemical containers and dispensers; manual, pneumatic and electrical gas flow controllers; gas flow monitors; cleaning equipment for cleaning commercial components and surfaces in a vacuum chamber using cleaning compositions under subatmospheric pressure conditions, or for in situ cleaning of components and surfaces of commercial vacuum equipment installations using cleaning compositions under subatmospheric pressure conditions, comprising computer software and electronic controls to enable automation of entire cleaning process, vacuum chambers and pumps, tubing, valves, pressure transducers and optional sensors; automatic valves, control valves for regulating the flow of gases and liquids, and electronic valves for controlling gas or fluids; dispensed material flow monitors; monitors for use in monitoring effluents for subsequent treatment, which are generated in the manufacture of microelectronic products, semiconductors, digital storage media, flat-panel displays, and integrated circuits; polymeric film bioreactors for research, development and production applications in the life sciences, biotech and pharmaceutical industries;semiconductor manufacturing machines; semiconductor wafer processing equipment; cleaning machines for cleaning parts from commercial vacuum equipment; pneumatic valves;empty metallic containers for storing and delivering chemicals and liners therefor; manually operated metal inlet, outlet, and refill valves; manually operated metal manifolds for transferring chemicals; pipes and tubes of metal for transferring chemicals; empty metal canisters for chemical delivery and empty metal chemical refill canisters for holding chemicals for use in the manufacture of microelectronic products, semiconductors, digital storage media, flat-panel displays, and integrated circuits; manual metal inlet and outlet valves, manifolds, pipes, tubes and metal pipes, conduits, manifolds, couplings, fittings and joints, for filling, packaging, storage and delivery of chemicals; metal chemical delivery equipment, namely, empty metal chemical containers and conduits, for use in the manufacture, testing and qualification of microelectronic products, semiconductors, flat-panel displays, integrated circuits, electronic systems and subsystems; empty metal gas supply containers for holding adsorbent material on which adsorbed gas is stored and from which gas is desorbed for dispensing from the container; empty metal gas supply containers for holding solid or liquid material from which gas or vapor is generated for dispensing from the container; gas supply equipment for storing gases and dispensing such gases on demand, namely, empty metal containers for holding the gas in a pressurized or liquid form and regulators sold as a unit therewith, for on-demand dispensing of such gas; empty metal containers utilizing internal heat transfer components, for storage of chemical source materials and delivery of vapor-phase material therefrom for use in cleaning of semiconductor manufacturing equipment; empty metal containers for chemical storage; empty metal containers for gas supply; empty metal containers for chemical storage and dispensing; metal conduits; manual metal valves; empty metal chemical storage and dispensing containers with internal plastic liners for holding flowable materials for subsequent dispensing;disposable plastic and synthetic bags for material containment, transfer and dispensing; plastic bags for containment and delivery of materials;cleaning services for microelectronics manufacturing, namely, cleaning of wafers previously used for monitoring of semiconductor manufacturing equipment and processes, reworking of product wafers, cleaning of product wafers and monitor wafers, and cleaning of machines and machine parts coated with microelectronics manufacturing fabrication materials;cleaning compositions for subatmospheric pressure cleaning of commercial vacuum equipment; chemical cleaners for use in cleaning of equipment for manufacture of microelectronic products, semiconductors, flat-panel displays, integrated circuits, electronic systems and subsystems; cleaning preparations for removing unwanted deposits and extraneous materials from semiconductor device substrates during the manufacture of microelectronic products; solid/liquid abrasive slurries used for planarizing surfaces in the manufacture of microelectronic products, semiconductors, digital storage media, flat-panel displays, and integrated circuits; polishing preparations used for finish processing of surfaces in the manufacture of microelectronic products, semiconductors, digital storage media, flat-panel displays, and integrated circuits; cleaning preparations for removing unwanted deposited material and contaminants from wafers and partially finished substrates of microelectronic products so that they can be recycled for finishing;PRO ACT;technical consultation and support services in the nature of product information provided by telecommunications interaction and in person, relating to equipment, processes, materials and technology for manufacturing, testing, packaging and qualification of microelectronic products, semiconductors, flat-panel displays, integrated circuits, electronic systems and subsystems by others;chemical reagents for non-medical purposes; chemical compositions capable of undergoing change by processing to yield chemical products for use in the manufacture of microelectronic products, semiconductors, digital storage media, flat-panel displays, and integrated circuits; solvent compositions for use in the manufacture of microelectronic products, semiconductors, digital storage media, flat-panel displays, and integrated circuits; doping compounds for use in the manufacture of microelectronic products, semiconductors, digital storage media, flat-panel displays, and integrated circuits; chemical compositions that yield decomposition products or reaction products in processes employing same, for use in the manufacture of microelectronic products, semiconductors, digital storage media, flat-panel displays, and integrated circuits; etchants for use in the manufacture of microelectronic products, semiconductors, digital storage media, flat-panel displays, and integrated circuits; photoresists; chemicals for use in electrochemical deposition processes in the manufacture of microelectronic products, semiconductors, digital storage media, flat-panel displays, and integrated circuits; metal plating chemical compositions; gases used for deposition, etching, lithography, planarization, plasma treatment, ashing, cleaning, ion implantation, and annealing, in the manufacture of microelectronic products, semiconductors, digital storage media, flat-panel displays, and integrated circuits; materials used for deposition, etching, lithography, planarization, plasma treatment, ashing, cleaning, ion implantation, and annealing, in the manufacture of microelectronic products, semiconductors, digital storage media, flat-panel displays, and integrated circuits; doping compound gases and chemical vapor deposition precursor gases for use in the manufacture of microelectronic products, semiconductors, digital storage media, flat-panel displays, and integrated circuits; chemicals for use in treating hazardous gases produced in the manufacture of microelectronic products, semiconductors, digital storage media, flat-panel displays, and integrated circuits, to reduce the hazardous character of such gases; chemical source materials for the deposition of thin films in the manufacture of microelectronic products, semiconductors, digital storage media, flat-panel displays, and integrated circuits; organometallic chemicals for use in the manufacture of microelectronic products, semiconductors, digital storage media, flat-panel displays, and integrated circuits; ion implantation precursors for use in the manufacture of microelectronic products, semiconductors, digital storage media, flat-panel displays, and integrated circuits; chemicals for use in chemical reagent delivery systems for use in the manufacture of microelectronic products, semiconductors, digital storage media and flat-panel displays; gases provided in a gas supply container holding adsorbent material on which the gas is adsorbed, for use in the manufacture of microelectronic products, semiconductors, digital storage media, flat-panel displays, and integrated circuits, for deposition, etching, lithography, planarization, plasma treatment, ashing, cleaning, ion implantation, and annealing; gaseous chemicals in vapor or liquid form, for use in deposition, etching, lithography, planarization, plasma treatment, ashing, cleaning, ion implantation and annealing, in the manufacture of microelectronic products, semiconductors, flat-panel displays, integrated circuits and in testing and qualification thereof; consumable solid, liquid and gaseous chemical compositions and cleaning compositions for use in the manufacture of semiconductors and flat panels; gases adsorbed on adsorbents in gas supply containers for sub-atmospheric pressure gas dispensing, for use in deposition, etching, lithography, planarization, plasma treatment, ashing, cleaning, ion implantation and annealing, in the manufacture of microelectronic products, semiconductors, digital storage media, flat-panel displays, and integrated circuits; solid adsorbents for use in storage and dispensing of gases for use in deposition, etching, lithography, planarization, plasma treatment, ashing, cleaning, ion implantation and anneling, in the manufacture of microelectronic products, semiconductors, digital storage media, flat-panel displays, and integrated circuits; ionic liquid storage media for use in storage and dispensing of gases for use in deposition, etching, lithography, planarization, plasma treatment, ashing, cleaning, ion implantation and annealing, in the manufacture of microelectronic products, semiconductors, digital storage media, flat-panel displays, and integrated circuits; chemical storage media for use in storage and dispensing of gases for use in deposition, etching, lithography, planarization, plasma treatment, ashing, cleaning, ion implantation and annealing, in the manufacture of microelectronic products, semiconductors, digital storage media, flat-panel displays, and integrated circuits; solid and liquid chemicals provided in a vapor supply container for use in generating vapor for manufacture of microelectronic products, semiconductors, flat-panel displays, integrated circuits, electronic systems and subsystems; chemical compositions useful for removing microelectronics manufacturing fabrication materials from microelectronic products such as wafers and microelectronic devices, that are rejected after such microelectronics manufacturing fabrication materials have been deposited on them, and that are recycled following the removal of such materials; adsorbent materials having industrial gases adsorbed thereon;plastic containers for liquid chemicals, liners therefor, and dispensers for use therewith, all for commercial use; metal chemical delivery cabinets for housing metal containers, valves, manifolds and pipes of metal; polymeric film mixing vessels for research, development and production applications in the life sciences, biotech and pharmaceutical industries;technical support services in the nature of troubleshooting and engineering design, relating to testing, packaging and qualification of microelectronic products, semiconductors, flat-panel displays, integrated circuits, electronic systems and subsystems by others; design and engineering services related to testing, packaging and qualification of microelectronic products, semiconductors, flat-panel displays, integrated circuits, electronic systems and subsystems by others;

Q4D

analytical monitoring and process control equipment;

SCRAM

hazardous gas leakage containment, removal, and treatment apparatus in the nature of a gas scrubber, sold as a unit;

SPARTA

liquid vaporization and delivery apparatus for chemical vapor deposition applications;

TGM

Gas monitoring unit, for monitoring multiple locations for the presence of hazardous gases;

VAPORSOURCE

vaporizer equipment for use in the vaporization of reagents for vapor-phase transport and deposition of materials;VAPOR SOURCE;

VECTOR

In the heading after Int. Cl.: 11 should be deleted, and, 7 should be inserted. In the statement, column 1, line 7, 11 should be deleted, and, 7 should be inserted.;Pollution control machines in the nature of fume scrubbers;

WANDMIXER

Agitators for circulating liquid media; Mixing machines;WAND MIXER;Containers, not of metal for commercial use; Plastic storage containers for commercial or industrial use;

WANDREACTOR

Bioreactors for cell culturing; laboratory mixers for use in mixing liquids and powders for laboratory and industrial use; laboratory mixers for mixing liquids and powders for use in the pharmaceutical and chemical industries;WAND REACTOR;Containers, not of metal for commercial use; non-metal storage and process containers for use in the pharmaceutical and biotechnology industries;

XE-CLEAN

Metal containers, and metal containers utilizing internal heat transfer components, for storage of chemical source materials and delivery of vapor-phase material therefrom for use in cleaning of semiconductor manufacturing equipment;Chemical cleaners for use in cleaning of semiconductor manufacturing equipment;