PROCESSING GASES USE

Brand Owner Address Description
NOVASOURCE ADVANCED TECHNOLOGY MATERIALS, INC. 7 Commerce Drive Danbury CT 06810 processing gases for use in the manufacture of semiconductors, flat panel displays, compact discs, and recording media;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. High flows of low-mass fluent gases are used in an HDP-CVD process for gapfill deposition of a silicon oxide film. An enhanced turbomolecular pump that provides a large compression ratio for such low-mass fluent gases permits pressures to be maintained at relatively low levels in a substrate processing chamber, thereby improving the gapfill characteristics.