PHOTOMASK SUBSTRATES

Brand Owner (click to sort) Address Description
AFEFT SHENZHEN FOTOTECH PHOTOGRAPHIC EQUIPMENT CO.,LTD Unit D-1, 18/F, Blk B, World Trade Plaza Fuhong Road, Futian District Shenzhen, Guangdong 518000 China Photomask substrates, namely, synthetic quartz glass plates being structural parts of excimer steppers, for use in fabrication of integrated circuits; Stands for photographic apparatus; Tripods for cameras; Flashlights for use in photography; Protective eye pieces; Lenses for telescopes; Lenses for microscopes; Optical lamps; Optical lenses; Eyewear; Optical glasses; Optical condensers; Photometers; Light emitting diodes (LEDs); Inverters; Lighting control apparatus; Photographic transparencies; Optical apparatus, namely, an aperture stop which is a diaphragm having a thin opaque structure with an opening at its center for inspection of semiconductor materials, namely, semiconductor wafers, reticles, and photomasks; Bags for cameras and photographic equipment; Batteries; Downloadable mobile applications for adjusting color temperature and color aberration in photography;
LINKSTAR Shenzhen Tong Bu Ying Xiang Equipment Co., Ltd. 1127-8 Daewon Plaza 2nd Fl. Jung-Dong Bucheon 420-020 Republic of Korea Photomask substrates, namely, a wire or glass screen for photoengraving; Stands for photographic apparatus; Tripods for cameras; Flashlights for use in photography; Protective eye pieces; Lenses for microscopes; Optical lamps; Optical lenses; Eyewear; Scientific and technical apparatus, namely, optical mirrors; Optical condensers; Photometers; Light emitting diodes (LEDs); Inverters; Lighting control apparatus; Photographic transparencies; Optical apparatus, namely, an aperture stop which is a diaphragm having a thin opaque structure with an opening at its center; Bags for cameras and photographic equipment; Galvanic cells; Downloadable mobile applications for editing photos;LINK STAR;
MICROTRONICS PHOTOMASK Applied Image, Inc. 1653 East Main Street Rochester NY 14609 Photomask substrates, namely, synthetic quartz glass plates being structural parts of excimer steppers, for use in fabrication of integrated circuits;MICROTRONICS PHOTO MASK;PHOTOMASK;
POCKELITE Shenzhen Tong Bu Ying Xiang Equipment Co., Ltd. 1127-8 Daewon Plaza 2nd Fl. Jung-Dong Bucheon 420-020 Republic of Korea Photomask substrates, namely, a wire or glass screen for photoengraving; Stands for photographic apparatus; Tripods for cameras; Flashlights for use in photography; Protective eye pieces; Lenses for microscopes; Optical lamps; Optical lenses; Eyewear; Scientific and technical apparatus, namely, optical mirrors; Optical condensers; Photometers; Light emitting diodes (LEDs); Inverters; Lighting control apparatus; Photographic transparencies; Optical apparatus, namely, an aperture stop which is a diaphragm having a thin opaque structure with an opening at its center; Bags for cameras and photographic equipment; Galvanic cells; Downloadable mobile applications for editing photos;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. Methods of fabricating a photomask, methods of treating a chemically amplified resist-coated photomask blank, a photomask blank resulting from the methods, and systems for fabricating a photomask are provided. The method is useful for recovering the exposure sensitivity of a chemically amplified resist disposed on a photomask blank from a post-coat delay effect.