AFEFT

Welcome to the Brand page for “AFEFT”, which is offered here for Photomask substrates, synthetic quartz glass plates being structural parts of excimer steppers, for use in fabrication of integrated circuits; stands for photographic apparatus; tripods for cameras; flashlights for use in photography; protective eye pieces; lenses for telescopes; lenses for microscopes; optical lamps; optical lenses; eyewear; optical glasses; optical condensers; photometers; light emitting diodes (leds); inverters; lighting control apparatus; photographic transparencies; optical apparatus, an aperture stop which is a diaphragm having a thin opaque structure with an opening at its center for inspection of semiconductor materials, semiconductor wafers, reticles, and photomasks; bags for cameras and photographic equipment; batteries; downloadable mobile applications for adjusting color temperature and color aberration in photography;.

Its status is currently believed to be active. Its class is unavailable. “AFEFT” is believed to be currently owned by “SHENZHEN FOTOTECH PHOTOGRAPHIC EQUIPMENT CO.,LTD”.

Owner:
SHENZHEN FOTOTECH PHOTOGRAPHIC EQUIPMENT CO.,LTD
Owner Details
Description:
Photomask substrates, synthetic quartz glass plates being structural parts of excimer steppers, for use in fabrication of integrated circuits; Stands for photographic apparatus; Tripods for cameras; Flashlights for use in photography; Protective eye pieces; Lenses for telescopes; Lenses for microscopes; Optical lamps; Optical lenses; Eyewear; Optical glasses; Optical condensers; Photometers; Light emitting diodes (LEDs); Inverters; Lighting control apparatus; Photographic transparencies; Optical apparatus, an aperture stop which is a diaphragm having a thin opaque structure with an opening at its center for inspection of semiconductor materials, semiconductor wafers, reticles, and photomasks; Bags for cameras and photographic equipment; Batteries; Downloadable mobile applications for adjusting color temperature and color aberration in photography;
Categories: PHOTOMASK SUBSTRATES