TOPPAN PHOTOMASKS, INC.

ACUITY

Custom manufacturing at the order and specification of others, namely, photoresist and etch services, for the manufacture of photomasks; custom manufacturing at the order and specification of others, namely, photoresist and etch services, for the optical transfer of integrated circuit images onto semiconductor wafers; custom manufacturing at the order and specification of others, namely, photoresist and etch services, for altering and blocking light as applied to photomasks;Power equipment, namely, pattern generators, etch tools, inspection tools, metrology tools, repair tools, and photoresists, used for the manufacture of photomasks, the optical transfer of integrated circuit images onto semiconductor wafers, and for altering and blocking light as applied to photomasks;Clear substrates, namely, glass or quartz, imaged with device layers for exposing silicon substrates; quartz or glass substrates imaged with microscopic structures in the manufacture of integrated circuits, micro-electrical mechanical structures (MEMS), optical components and systems;Photolithography for the transfer of integrated circuit images onto various substrates, namely, semiconductor wafers, GaAs wafers, III-V compound wafers, quartz, and glass;

DEFINITY

[Customer] *Custom* manufacturing at the order and specification of others, namely, photoresist and etch services, for the manufacture of photomasks; custom manufacturing at the order and specification of others, namely, photoresist and etch services, for the optical transfer of integrated circuit images onto semiconductor wafers; custom manufacturing at the order and specification of others, namely, photoresist and etch services, for altering and blocking light as applied to photomasks;In the statement, Column 2, line 1, CUSTOMER should be deleted, and, CUSTOM should be inserted.;Power equipment, namely, pattern generators, etch tools, inspection tools, metrology tools, repair tools, and photoresists, used for the manufacture of photomasks, the optical transfer of integrated circuit images onto semiconductor wafers, and for altering and blocking light as applied to photomasks;Clear substrates, namely, glass or quartz, imaged with device layers for exposing silicon substrates; quartz or glass substrates imaged with microscopic structures in the manufacture of intergrated circuits, micro-electrical mechanical structures (MEMS), optical components and systems;Photolithography for the transfer of integrated circuit images onto various substrates, namely, semiconductor wafers, GaAs wafers, III-V compound wafers, quartz, and glass;

EMASK

ELECTRONIC MASK;Customer service in the nature of a secure online database allowing customers to view, monitor, and verify status of their orders, namely, photomask patterns, for the purpose of data checking and verification;

ENABLING MANUFACTURABLE DESIGN

Computer software for semiconductor design;

FAST TRACK

Providing use of online non-downloadable software for determining customer, purchase and account information for photomasks, and for determining the progression of an order for photomasks through the manufacturing process;

LUMINEX

Custom manufacturing at the order and specification of others, namely, photoresist and etch services, for the manufacture of photomasks; custom manufacturing at the order and specification of others, namely, photoresist and etch services, for the optical transfer of integrated circuit images onto semiconductor wafers; custom manufacturing at the order and specification of others, namely, photoresist and etch services, for altering and blocking light as applied to photomasks;Power equipment, namely, pattern generators, etch tools, inspection tools, metrology tools, repair tools and photoresists, used for the manufacture of photomasks, the optical transfer of integrated circuit images onto semiconductor wafers, and for altering and blocking light as applied to photomasks;Clear substrates, namely, glass or quartz, imaged with device layers for exposing silicon substrates; quartz or glass substrates imaged with microscopic structures in the manufacture of integrated circuits, micro electrical mechanical structures (MEMS), optical components and systems;Photoligraphy for the transfer of integrated circuit images onto various substrates, namely, semiconductor wafers, GaAs wafers, III-V compound wafers, quartz, and glass;

OPENACCESS

computerized, secure online ordering services featuring photomasks, that allows users to order, monitor the manufacturing status of their photomask orders, and to establish customer, account and purchase information regarding photomasks;

ORDER DIRECT

Computerized, secure online ordering services featuring photomasks, that allow users to create personalized profiles, specify products and establish customer, purchase and account information to accelerate and customize the photomask manufacturing process;ORDER DIRECT;

PERFECTLY FOCUSED

Custom manufacturing at the order and specification of others, namely, photoresist and etch services, for the manufacture of photomasks; custom manufacturing at the order and specification of others, namely, photoresist and etch services, for the optical transfer of integrated circuit images onto semiconductor wafers; custom manufacturing at the order and specification of others, namely, photoresist and etch services, for altering and blocking light as applied to photomasks;

PERFECTLY FOCUSED

Photolithography for the transfer of integrated circuit images onto various substrates, namely, semiconductor wafers, GaAs wafers, III-V compound wafers, quartz, and glass;