STEAG MICROTECH GMBH

BARRACUDA

Machines for the manufacture and treatment of semiconductor substrates, silicon chips, wafers, LCD-substrates, LCD-displays, semiconductor chips and solar cells as well as their surfaces; machines for drying, cleaning and etching of silicon chips in semiconductor production as well as wet-processing machines therefor and for oxidation with ozonated water, for oxidation with dilute hydrofluoric and hydrochloric acid and for particle cleaning in ammonia and hydrogen peroxide acid bath, as well as for ozone-steam-strip-cleaning for removing organic impurities and photo sensitive resist; drying machines using nitrogen, alcohol-vapors and/or mixtures thereof; machines for drying and wet processing of semiconductor substrates silicon chips, wafers, LCD-substrates, LCD-displays, semiconductors chips and solar cells as well as their surfaces;Installation and maintenance of machines for the manufacture and treatment of semiconductor substrates, silicon chips, wafers, LCD-substrates, LCD-displays, semiconductor chips and solar cells as well as their surfaces; Machines and systems for drying, cleaning and etching of silicon chips in semiconductor production as well as wet-processing machines therefor and for oxidation with ozonated water, for oxidation with dilute hydrofluoric and hydrochloric acid and for particle cleaning in ammonia and hydrogen peroxide acid bath, as well as for ozone-steam-strip-cleaning for removing organic impurities and photo sensitive resist; drying machines using nitrogen, alcohol-vapors and/or mixtures thereof; machines for drying and wet processing of semiconductor substrates, silicon chips, wafers, LCD-substrates, LCD-displays, semiconductor chips and solar cells as well as their surfaces;

DAMAS-CLEAN

Machine for the manufacture of semiconductor substrates, silicon discs, wafers, LCD-substrates, LCD-displays, semiconductor chips and/or solar cells; machines for the treatment, coating, polishing, cleaning and drying of semiconductor and LCD substrates;Installation and maintenance of machines for the manufacture of semiconductor substrates, silicon discs, wafers, LCD-substrates, LCD-displays, semiconductor chips and/or solar cells; machines for the treatment, coating, polishing, cleaning and/or drying of substrates; combination drying and wet-treatment units for the processing of semiconductor substrates, silicon discs, wafers, LCD-substrates, LCD-displays, semiconductor chips and/or solar cells as well as their surfaces;DAMAS CLEAN;Combination drying and wet-treatment units for the processing of semiconductor substrates, silicon discs, wafers, LCD-substrates, LCD-displays, semiconductor chips and/or solar cells as well as their surfaces;

MARANGONI LITE

Machines for the manufacture of semiconductor substrates, silicon chips and wafers, LCD-displays, and solar cells; machines for the treatment, coating, polishing, cleaning and drying of semiconductor substrates, silicon chips and wafers, LCD-displays and solar cells, as well as the surfaces thereof;Installation and repair and/or maintenance of machines for the manufacture of semiconductor substrates, silicon chips and wafers, LCD-displays, and solar cells and of machines for the treatment, coating, polishing, cleaning and drying of semiconductor substrates, silicon chips and wafers, LCD-displays and solar cells, as well as the surfaces thereof;MARONGONI LIGHT;MARONGONI LIGHT;LITE;

POKORNY

machines in the microtechnology industry and systems incorporating such machines; machines for manufacturing products in the field of solar technology, electronics, communications and optics, as well as systems incorporating such machines; machines for manufacturing and treating solar cells, semiconductors, semiconductor components and liquid crystal indicators, as well as systems incorporating such machines; machines for photolythography, electroplating, cleaning of quartz parts, as well as systems incorporating such machines; automatic industrial cleaning machines; digesters of plastic material or stainless steel; automatic quartz-tube cleaning machines; mobile and stationary apparatus for supplying chemical s to the aforementioned machines and systems; manual and partially and fully automatic machines for wet-process treatment; laboratory apparatus for wet-process treatment; laboratory work areas comprising the aforementioned machines, apparatus and systems; parts for the aforementioned machines, apparatus and systems;automatic industrial cleaning machines; industrial cleaning machines for quartz parts; mobile and stationary apparatus for supplying chemicals to the aforementioned machines and systems; metal and plastic conduits; fluid conveying apparatus comprising the aforementioned conduits, batteries, valves, pumps, filters, temperature controls and/or chemical containers; machines for wet chemistry; manual and partially and fully automatic machines for wet-process treatment; laboratory apparatus for wet-process treatment; parts for the aforementioned machines, apparatus and systems;providing design and associated technical consultation services to customers in connection with equipment in the fields of microtechnology, solar technology, electronics, communications, optics, photolithography, electroplating, solar cells, semiconductor products and liquid-crystal indicators, laboratory work stations, digesters, cleaning machines for quartz parts, casings and fluid conveying systems;

STEAG MICROTECH

In the statement, Column 1, before line 1, Steag Microtech GMBH (Fed. Rep. Germany Limited Partnership) Carl-Benz-Strasse 10, Pliezhausen, Fed, Rep. Germany 72124, by assignment and change of name from should be inserted.;mechanical apparatus, equipment and systems for manufacturing semiconductor substrates, silicon chips, wafers, LCD-substrates, LCD-displays, semiconductor chips, compact discs, video discs, CD-Roms and solar cells; drying and wet processing apparatus for treating semiconductor susbstrates, silicon chips, wafers, LCD-substrates, LCD-displays, semiconductor chips, compact discs, video discs, CD-Roms and solar cells as well as the surfaces thereof; manual and automatic apparatus for cleaning, lacquering, developing, etching and stripping semiconductor substrates, LCD-substrates, silicon discs and wafers as well as for developing masks for manufacturing semiconductor chips and for wafer treatment; spin coating apparatus for photo lacquers and color layers; apparatus, equipment, and systems for drying, cleaning and etching silicon discs during semiconductor chip manufacture as well as wet process apparatus and equipment therefor;installation and maintenance for others of the following items - mechanical apparatus, equipment and systems for manufacturing semiconductor substrates, silicon chips, wafers, LCD-substrates, LCD-displays, semiconductor chips, compact discs, video discs, CD-ROMs and solar cells; drying and wet processing apparatus for treating semiconductor substrates, silicon chips, wafers, LCD-substrates, LCD-displays, semiconductor chips, compact discs, video discs, CD-ROMs and solar cells as well as the surfaces thereof; manual and automatic apparatus for cleaning, lacquering, developing, etching and stripping semiconductor substrates, LCD-substrates, silicon discs and wafers as well as for developing masks for manufacturing semiconductor chips and for wafer treatment; spin coating apparatus for photo lacquers and color layers; apparatus, equipment, and systems for drying, cleaning and etching silicon discs during semiconductor chip manufacture as well as wet process apparatus and equipment therefor;

STEAG MICROTECH

In the statement, Column 1, lines 1 and 2, German Dem Rep should be deleted, and, Fed Rep of Germany should be inserted, and In the statement, Column 1, line 3, Strass should be deleted, and, Strasse should be inserted, and In the statement, Column 1, line 4, German Dem Rep should be deleted, and, Fed Rep of Germany should be inserted.;mechanical apparatus, equipment and systems for manufacturing semiconductor substrates, silicon chips, wafers, LCD-substrates, LCD-displays, semiconductor chips, compact discs, video discs, CD-ROMs and solar cells; drying and wet processing apparatus for treating semiconductor substrates, silicon chips, wafers, LCD-substrates, LCD-displays, semiconductor chips, compact discs, video discs, CD-ROMs and solar cells as well as the surfaces thereof; manual and automatic apparatus for cleaning, lacquering, developing, etching and stripping semiconductor substrates, LCD-substrates, silicon discs and wafers as well as for developing masks for manufacturing semiconductor chips and for wafer treatment; spin coating apparatus for photo lacquers and color layers; apparatus, equipment, and systems for drying, cleaning and etching silicon discs during semiconductor chip manufacture as well as wet process apparatus and equipment therefor;installation and maintenance for others of the following items; mechanical apparatus, equipment and systems for manufacturing semiconductor substrates, silicon chips, wafers, LCD-substrates, LCD-displays, semiconductor chips, compact discs, video discs, CD-ROMs and solar cells; drying and wet processing apparatus for treating semiconductor substrates, silicon chips, wafers, LCD-substrates, LCD-displays, semiconductor chips, compact discs, video discs, CD-ROMs and solar cells as well as the surfaces thereof; manual and automatic apparatus for cleaning, lacquering, developing, etching and stripping semiconductor substrates, LCD-substrates, silicon discs and wafers as well as for developing masks for manufacturing semiconductor chips and for wafer treatment; spin coating apparatus for photo lacquers and color layers; apparatus, equipment, and systems for drying, cleaning and etching silicon discs during semiconductor chip manufacture as well as wet process apparatus and equipment therefor;MICRO TECHNOLOGY;