Obducat AB

EFAACE

Material treatment services, namely, wafer thinning, metal treatment, and chemical etching;Electrical apparatus and instruments, namely, diode displays, flat panel displays, electro chemical etchers, substrate cleaners and photo resist coaters; electronic components, namely, semi-conductors, semi-conductor components, printed circuit boards, integrated circuits, semi-conductor chips, blank smart cards, electric conductors, microprocessors, blank CD, blank DVD, optical and magnetic hard drives; computer operating programs used to run and control processing equipment; laboratory equipment and supplies, namely, lithography mask, electro chemical etchers, printed wiring board and semiconductor wafer cleaners; lithographic film dispensers, emulsion applying devices, namely, roller coaters, dip coaters, resist spinners and electro deposited resist coaters, all for use in the field of chemistry and physics; bioanalytical instruments, namely, biochips; biosensors;Chemicals used in the manufacture of small structures in conductive and nonconductive materials, namely, conductive interconnects and dielectric spacers on semiconductors and printed circuit boards, information data encoding on CD, DVD, optical and magnetic storage media, and patterns on photo masks intended to reproduce the aforementioned small structures;[ Surgical and medical apparatus and instruments, namely, implanted catheter; apparatus and instruments for use in medical analysis, namely, blood analyzers ];

EITRE

[ Scanning Electron Microscopes (SEM); ] computer programs for control of Nano Imprint Lithography (NIL) and Electron Beam Recorder (EBR) machines and tools;Hydraulic printing and embossing machines; machines for Nano Imprint Litography (NIL), Electron Beam Recorder (EBR) based lithography and printing plates; semiconductor manufacturing machines; semiconductor wafer processing machines and equipment; electronic integrated circuits manufacturing machines; machines for manufacturing recorded optical storage discs and/or recorded magnetic data carriers, storage discs and electronic memories; machines for manufacturing flat panel display screens, liquid crystal display screens and light emitting diode display screens; all intended for research and/or industrial purposes;The wording EITRE appearing in the mark has no meaning in a foreign language.;

IPS

[ Scanning Electron Microscopes (SEM); ] computer programs for control of machines and tools for Nano Imprint Lithography (NIL) and Electron Beam Recorder (EBR);Electromechanical and/or hydraulic printing and embossing machines; machines for Nano Imprint Lithography (NIL), Electron Beam Recorder (EBR) based lithography and printing plates; semiconductor manufacturing machines; semiconductor wafer processing machines and equipment; electronic integrated circuits manufacturing machines; machines for manufacturing recorded optical storage discs, recorded magnetic data carriers, storage discs and electronic memories; machines for manufacturing flat panel display screens, liquid crystal display screens and light emitting diode display screens; all intended for research and/or industrial purposes;

OBDUCAT

Scanning Electron Microscopes (SEM); computer programs for control of Nano Imprint Lithography (NIL) and Electron Beam Recorder (EBR) machines and tools;Electromechanical and/or hydraulic printing and embossing machines; machines for Nano Imprint Litography (NIL), Electron Beam Recorder (EBR) based lithography and printing plates; semiconductor manufacturing machines; semiconductor wafer processing machines and equipment; electronic integrated circuits manufacturing machines; machines for manufacturing recorded optical storage discs and/or recorded magnetic data carriers, storage discs and electronic memories; machines for manufacturing flat panel display screens, liquid crystal display screens and light emitting diode display screens; all intended for research and/or industrial purposes;Color is not claimed as a feature of the mark.;OBDUCAT appearing in the mark has no meaning in a foreign language.;

SINDRE

[ Scanning Electron Microscopes (SEM); ] computer programs for control of Nano Imprint Lithography (NIL) and Electron Beam Recorder (EBR) machines and tools;Electromechanical and/or hydraulic printing and embossing machines; machines for Nano Imprint Litography (NIL), Electron Beam Recorder (EBR) based lithography and printing plates; semiconductor manufacturing machines; semiconductor wafer processing machines and equipment; electronic integrated circuits manufacturing machines; machines for manufacturing recorded optical storage discs and/or recorded magnetic data carriers, storage discs and electronic memories; machines for manufacturing flat panel display screens, liquid crystal display screens and light emitting diode display screens; all intended for research and/or industrial purposes;Color is not claimed as a feature of the mark.;The wording SINDRE appearing in the mark has no meaning in a foreign language.;

SOFTPRESS

[ Scanning Electron Microscopes (SEM); computer programs for control of machines and tools for Nano Imprint Lithography (NIL) and Electron Beam Recorder (EBR) ];Electromechanical and/or hydraulic printing and embossing machines; machines for Nano Imprint Lithography (NIL), Electron Beam Recorder (EBR) based lithography and printing plates; semiconductor manufacturing machines; semiconductor wafer processing machines and equipment; electronic integrated circuits manufacturing machines; machines for manufacturing recorded optical storage discs, recorded magnetic data carriers, storage discs and electronic memories; machines for manufacturing flat panel display screens, liquid crystal display screens and light emitting diode display screens; all intended for research and/or industrial purposes;SOFT PRESS;Color is not claimed as a feature of the mark.;

STU

[ Scanning Electron Microscopes (SEM); ] computer programs for control of machines and tools for Nano Imprint Lithography (NIL) and Electron Beam Recorder (EBR);Electromechanical and/or hydraulic printing and embossing machines; machines for Nano Imprint Lithography (NIL), Electron Beam Recorder (EBR) based lithography and printing plates; semiconductor manufacturing machines; semiconductor wafer processing machines and equipment; electronic integrated circuits manufacturing machines; machines for manufacturing recorded optical storage discs, recorded magnetic data carriers, storage discs and electronic memories; machines for manufacturing flat panel display screens, liquid crystal display screens and light emitting diode display screens; all intended for research and/or industrial purposes;