TITANIUM OXIDE

Brand Owner Address Description
STR Sakai Chemical Industry Co., Ltd. 5-2, Ebisujima-cho, Sakai-ku Sakai, Osaka 590-8502 Japan Titanium oxide; titanium compounds, namely, chemicals for use in industry as agents for coatings, printing inks, paper manufacturing, plastics, chemical fibers, rubber, enamel, glass, condenser, ceramics or cosmetic preparations and photo-catalysts for organic compositions, deodorizing, antibacterial, water purification and anti-fouling; titanium oxide compounds, namely, chemical preparations for use in industry as agents for coatings, printing inks, paper manufacturing, plastics, chemical fibers, rubber, enamel, glass, condenser, ceramics or cosmetic preparations and photo-catalysts for organic compositions, deodorizing, antibacterial, water purification and anti-fouling; titanium dioxide for industrial purposes as agents for coatings, printing inks, paper manufacturing, plastics, chemical fibers, rubber, enamel, glass, condenser, ceramics or cosmetic preparations and photo-catalysts for organic compositions, deodorizing, antibacterial, water purification and anti-fouling; zinc oxide for industrial use; priming putty, namely, glaziers putty; photographic developers; photographic emulsions; photographic fixers; photographic sensitizers; unprocessed plastics;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. High density oxide films are deposited by a pulsed-DC, biased, reactive sputtering process from a titanium containing target to form high quality titanium containing oxide films. A method of forming a titanium based layer or film according to the present invention includes depositing a layer of titanium containing oxide by pulsed-DC, biased reactive sputtering process on a substrate. In some embodiments, the layer is TiO2. In some embodiments, the layer is a sub-oxide of Titanium. In some embodiments, the layer is TixOy wherein x is between about 1 and about 4 and y is between about 1 and about 7. In some embodiments, the layer can be doped with one or more rare-earth ions. Such layers are useful in energy and charge storage, and energy conversion technologies.