PHOTOSENSITIVE RESISTS USED

Brand	Owner	Address	Description
STR	SHIPLEY COMPANY INC.	2300 WASHINGTON ST. NEWTON MA 02162	photosensitive resists used in the manufacture of electronic devices such as circuit boards and semiconductors;
	Where the owner name is not linked, that owner no longer owns the brand

Technical Examples

The present invention prevents cross-linking between multiple resists that are used in the fabrication of a semiconductor device. In order to prevent resists in close proximity or contact with one another from cross-linking, a non-reactive separation layer is disposed between the resists. The separation layer prevents incompatible components of the resists from reacting with one another. Forming the separation layer between the resists allows a resist located above the separation layer to be polymerized and patterned as desired without patterning another resist located below the separation layer. Methods of patterning multiple resists are also disclosed.