MEASUREMENT METROLOGY MACHINES MEASURING

Brand Owner (click to sort) Address Description
SURFACEWAVE SEMILAB AMS 47 MANNING ROAD BILLERICA MA 01821 Measurement metrology machines for measuring the thickness and properties of thin film that are deposited on silicon wafers to form semiconductor devices;SURFACE WAVE;
SURFACEWAVE Advanced Metrology Systems 12 Michigan Drive Natick MA 01760 Measurement metrology machines for measuring the thickness and properties of thin film that are deposited on silicon wafers to form semiconductor devices;SURFACE WAVE;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. This invention is an apparatus for imaging metrology, which in particular embodiments may be integrated with a processor station such that a metrology station is apart from but coupled to a process station. The metrology station is provided with a first imaging camera with a first field of view containing the measurement region. Alternate embodiments include a second imaging camera with a second field of view. Preferred embodiments comprise a broadband ultraviolet light source, although other embodiments may have a visible or near infrared light source of broad or narrow optical bandwidth. Embodiments including a broad bandwidth source typically include a spectrograph, or an imaging spectrograph. Particular embodiments may include curved, reflective optics or a measurement region wetted by a liquid. In a typical embodiment, the metrology station and the measurement region are configured to have 4 degrees of freedom of movement relative to each other.