LIGHT SENSITIVE PHOTORESIST COMPOSITIONS FOR USE

Brand Owner (click to sort) Address Description
2400 SHIPLEY COMPANY INC. 2300 WASHINGTON ST. NEWTON MA 02162 LIGHT-SENSITIVE PHOTORESIST COMPOSITIONS FOR USE IN THE MANUFACTURE OF ELECTRONIC COMPONENTS, NAMELY INTEGRATED AND PRINTED CIRCUITS;
3000 SHIPLEY COMPANY INC. 2300 WASHINGTON ST. NEWTON MA 02162 LIGHT-SENSITIVE PHOTORESIST COMPOSITIONS FOR USE IN THE MANUFACTURE OF ELECTRONIC COMPONENTS, NAMELY INTEGRATED AND PRINTED CIRCUITS;
SJR 1254 SHIPLEY COMPANY INC. 2300 WASHINGTON ST. NEWTON MA 02162 LIGHT-SENSITIVE PHOTORESIST COMPOSITIONS FOR USE IN THE MANUFACTURE OF ELECTRONIC COMPONENTS, NAMELY INTERGRATED AND PRINTED CIRCUITS;
SJR 1440 SHIPLEY COMPANY INC. 2300 WASHINGTON ST. NEWTON MA 02162 LIGHT-SENSITIVE PHOTORESIST COMPOSITIONS FOR USE IN THE MANUFACTURE OF ELECTRONIC COMPONENTS, NAMELY INTEGRATED AND PRINTED CIRCUITS;
SJR 1825 SHIPLEY COMPANY INC. 2300 WASHINGTON ST. NEWTON MA 02162 LIGHT-SENSITIVE PHOTORESIST COMPOSITIONS FOR USE IN THE MANUFACTURE OF ELECTRONIC COMPONENTS, NAMELY INTEGRATED AND PRINTED CIRCUITS;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. The present invention relates to photoresist compositions for EUV and methods for forming photoresist patterns. More specifically, fine photoresist patterns: of less than 50 nm without collapse are formed with EUV (Extreme Ultraviolet) as an exposure light source by using a negative photoresist composition comprising a melamine derivative and polyvinylphenol.