FORTY FOUR

Brand Owner (click to sort) Address Description
0044 Shimamura, Seiichiro Royal Garden No. 102 7-14 Aobadai 1-chome, Meguro-ku Tokyo Japan FORTY FOUR;Clothing, namely, belts, caps, coats, footwear, hats, jackets, overcoats, pants, pullovers, shirts, shoes, skirts, sweaters, tee-shirts, trousers, and knitwear, namely, sweaters, mittens, knit shirts, waistcoats, vests, cardigans, shawls, scarves, knit caps, jumpers, and knit hats;
44 TRUCK-LITE CO., INC. 310 East Elmwood Avenue Falconer NY 14733 FORTY FOUR;LIGHT EMITTING DIODES LIGHTING PRODUCTS FOR VEHICLES, NAMELY, HEADLIGHTS; TAIL LIGHTS; MARKER LIGHTS; CLEARANCE LIGHTS; IDENTIFICATION LIGHTS; STOP LIGHTS; TURN LIGHTS; LIGHTING KITS COMPRISED OF FLANGES, LAMPS, PLUGS AND GROMMETS; LICENSE PLATE LIGHTS; BACK-UP LIGHTS; INTERIOR AND UTILITY LIGHTS; SNOW PLOW LIGHTS; FOG AND DRIVING LIGHTS; DAYTIME RUNNING LIGHTS; AND FLASHING LIGHTS; INCANDESCENT LIGHTING PRODUCTS FOR VEHICLES, NAMELY, HEADLIGHTS; TAIL LIGHTS; MARKER LIGHTS; CLEARANCE LIGHTS; IDENTIFICATION LIGHTS; STOP LIGHTS, TURN LIGHTS; LIGHTING KITS COMPRISED OF FLANGES, LAMPS, PLUGS AND GROMMETS; LICENSE PLATE LIGHTS; BACK-UP LIGHTS; INTERIOR AND UTILITY LIGHTS; SNOW PLOW LIGHTS; FOG AND DRIVING LIGHTS; DAYTIME RUNNING LIGHTS; AND FLASHING LIGHTS;
FORTY4 Shenzhen Langdong Electronic Commerce Co., Ltd. C101, Red Sandalwood Bureau, Vanke City Bantian Street, Longgang District Shenzhen 518000 China FORTY FOUR;Electric fans; Electric fans for personal use; USB-powered desktop fans; Portable electric fans;
O44 Bat Brothers, Inc. Suite 101-A 5595 SW 80 Street Miami FL 33143 FORTY FOUR;Cigars;
THE 44 HAN, CANDICE 11100 Sepulveda Blvd, Suite #8-1012 Mission Hills CA 91345 THE FORTY FOUR;Organization of business conventions; Public relations, advertising and marketing services relating to promotion of independent brands and thought leadership in the field of sustainability, conservation, sustainability, and social responsibility;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. A system and method is disclosed for selectively increasing a wet etch rate of a large raised area portion of a semiconductor wafer with respect to a wet etch rate of a small raised area portion of the semiconductor wafer. A resist mask on the semiconductor wafer is etched to create a large via over the large raised area portion and a small via over the small raised area portion. An ion implantation beam is applied with an impact direction that enables ions to pass through the large via but does not enable ions to pass through the small via. The ions that pass through the large via increase the wet etch rate of the underlying portion of the semiconductor wafer. In one embodiment the impact direction has a tilt angle of forty five degrees and a rotation angle of forty five degrees.