FLOWABLE CVD GAPFILL INSULATING FILM

Brand	Owner	Address	Description
ARNO	APPLIED MATERIALS, INC.	3050 Bowers Avenue Santa Clara CA 95054	Flowable CVD gapfill insulating film with etch selectivity for use in semiconductor manufacturing patterning applications;
	Where the owner name is not linked, that owner no longer owns the brand

Technical Examples

High flows of low-mass fluent gases are used in an HDP-CVD process for gapfill deposition of a silicon oxide film. An enhanced turbomolecular pump that provides a large compression ratio for such low-mass fluent gases permits pressures to be maintained at relatively low levels in a substrate processing chamber, thereby improving the gapfill characteristics.