EPITAXIAL REACTORS

Brand	Owner	Address	Description
WARM AL	APPLIED MATERIALS, INC.	3050 Bowers Avenue Santa Clara CA 95054	epitaxial reactors, computer software for use in processing semiconductor wafers;repair and maintenance services for such semiconductor wafer processing equipment, components and semiconductor processing computer programs;
	Where the owner name is not linked, that owner no longer owns the brand

Technical Examples

Process for preparing oligomers of alkenes having from 4 to 8 carbon atoms from a feed stream comprising such alkenes or hydrocarbon streams in which such alkenes are present over a nickel-containing, heterogeneous catalyst in n successive adiabatically operated reactors, where n is 2 or an integer greater than 2, at from 30 to 280Â° C. and pressures of from 1 to 300 bar, where the feed stream has a temperature Tin when it enters the first reaction zone, experiences a temperature increase in each reaction zone and, if this temperature increase is more than Tin+20Â° C., is brought to a temperature in the range TinÂ±20Â° C. before it enters a subsequent reaction zone, wherein the feed stream is divided and the feed substreams obtained in this way are fed to the 2 reactors, or if more than 2 reactors are used to at least 2 of the reactors, with addition of fresh feed in such a way that the temperature in one of the reactors is at most 20Â° C. higher than that in each of the other reactors used.