DRESSMAKERS' DUMMIES

Brand Owner (click to sort) Address Description
A GROUPE AUCHAN 40 avenue de FlandreF-59170 CROIX
France
Advertising services; publication of advertising texts; ...
FABULOUS FIT GORAY, JILL RALSTON 116 FRANKLIN STREET, #4
NEW YORK NY 10013
dressmakers' dummies
 

Where the owner name is not linked, that owner no longer owns the brand

   
Technical Examples
  1. A photolithography and etch process sequence includes a photomask having a pattern with compensation features that alleviate patterning variations due to the proximity effect and depth of focus concerns during photolithography. The compensation features may be disposed near isolated or outermost lines of a device pattern. A photoresist pattern is formed to include the compensation features and the pattern etched to form a corresponding etched pattern including the compensation features. After etching, a protection material is formed over the layer and a trim mask is used to form a further photoresist pattern over the protection material. A subsequent etching pattern etches the protection material and removes the compensation features and results in the device lines being formed unaffected by proximity effects. Flare dummies may additionally be added to the mask pattern to increase pattern density and assist in endpoint detection. Flare dummies, like the compensation features, are subsequently removed by a photolithography and etching process sequence.