CLEANING PREPARATIONS CONTAINING MICROBIAL ENZYMES

Brand Owner (click to sort) Address Description
CLEANCHOICE PHIBRO ANIMAL HEALTH CORPORATION Glenpointe Centre East, 3rd Floor 300 Frank W. Burr Blvd., Ste. 21 Teaneck NJ 07666 Cleaning preparations containing microbial enzymes, used to preserve drain systems and waterways;CLEAN CHOICE;Bacillus and other microbes suspended in powdered or liquid form for sanitation, odor control and wastewater treatment applications; Bacteria for waste water treatment;
DRAIN LINE PROBIOTIC OSPREY BIOTECHNICS, INC. 1845 57th Street Sarasota FL 34243 Cleaning preparations containing microbial enzymes, used to preserve drain systems and waterways; Cleaning preparations for cleansing drains;
DRAINXCEL The GreenEdge Group Suite D7, No. 620 34522 North Scottsdale Road Scottsdale AZ 85266 Cleaning preparations containing microbial enzymes, used to preserve drain systems and waterways; Cleaning preparations for cleansing drains; Drain openers;DRAIN EXCEL;
MCDRAIN OSPREY BIOTECHNICS, INC. 1845 57th Street Sarasota FL 34243 Cleaning preparations containing microbial enzymes, used to preserve drain systems and waterways;Bacteria for waste water treatment;
SPECTRA-ZYME STERIS INSTRUMENT MANAGEMENT SERVICES, INC. 3316 2nd Avenue North Birmingham AL 35222 Cleaning preparations containing microbial enzymes for cleaning medical instruments manually or in automated washers;
SPORICLEAN SporiCLEAN 2348 Walter Road Westlake OH 44145 Cleaning preparations containing microbial enzymes, used to preserve drain systems and waterways, for use on all washable surfaces within any institutional, industrial, commercial and/or residential facility;SPORI CLEAN;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. An antimicrobial cleaning composition and methods for cleaning semiconductor substrates, particularly after chemical mechanical planarization or polishing, are provided. In one embodiment, the cleaning composition combines a solvent, a cleaning agent such as a hydroxycarboxylic acid or salt thereof, and at least one antimicrobial agent resulting in a cleaning composition in which microbial growth is inhibited. Examples of suitable antimicrobial agents include a benzoic acid or salt such as potassium or ammonium benzoate, and sorbic acid or salt such as potassium sorbate. The composition is useful for cleaning a wafer and particularly for removing residual particles after a conductive layer has been planarized to a dielectric layer under the conductive layer in a chemical mechanical planarization of a semiconductor wafer with abrasive slurry particles, particularly after a CMP of copper or aluminum films. Use of the cleaning composition advantageously inhibits microbial growth in the cleaning solution and deposition on the cleaned planarized surface.