CHEMICALS PHOTORESISTS

Brand Owner (click to sort) Address Description
MMPA TOKYO OHKA KOGYO CO., LTD. 150 Nakamaruko, Nakahara-ku, Kawasaki Kanagawa 211-0012 Japan Chemicals for photoresists, namely rinsing solution and stripping solution; chemicals for flat panel display substrates, namely, rinsing solution; chemicals for semiconductors, namely, rinsing solution;
T Z N TOKYO OHKA KOGYO CO., LTD. 150 Nakamaruko, Nakahara-ku, Kawasaki Kanagawa 211-0012 Japan Chemicals for photoresists, namely, stripping solution and rinsing solution; chemicals, namely, surface modifiers; industrial chemicals; chemical preparations for scientific purposes; adhesives, not for stationery or household purposes; photoresists; photographic developers;
TZNR TOKYO OHKA KOGYO CO., LTD. 150 Nakamaruko, Nakahara-ku, Kawasaki Kanagawa 211-0012 Japan Chemicals for photoresists, namely, stripping solution and rinsing solution; chemicals, namely, surface modifiers; industrial chemicals; chemical preparations for scientific purposes; adhesives, not for stationery or household purposes; photoresists; photographic developers;
VFR TOKYO OHKA KOGYO CO., LTD. 150 Nakamaruko, Nakahara-ku, Kawasaki Kanagawa 211-0012 Japan Chemicals for photoresists, namely rinsing solution and stripping solution; chemicals for flat panel display substrates, namely, rinsing solution; chemicals for semiconductors, namely, rinsing solution;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. New photoresists are provided that are suitable for short wavelength imaging, including sub-300 nm and sub-200 nm such as 193 nm and 157 nm. Photoresists of the invention contain a resin with photoacid-labile groups, one or more photoacid generator compounds, and an adhesion-promoting additive compound. Photoresists of the invention can exhibit significant adhesion to SiON and other inorganic surface layers.