BATCH THERMAL CHEMICAL VAPOR DEPOSITION

Brand	Owner	Address	Description
INTEGRITY	Lam Research Corporation	4650 Cushing Parkway Fremont CA 94538	batch thermal chemical vapor deposition apparatus for processing semiconductors;
	Where the owner name is not linked, that owner no longer owns the brand

Technical Examples

A technique for more efficiently forming conductive elements, such as conductive layers and electrodes, using chemical vapor deposition. A conductive precursor gas, such as a platinum precursor gas, having organic compounds to improve step coverage is introduced into a chemical vapor deposition chamber. A reactant is also introduced into the chamber that reacts with residue organic compounds on the conductive element so as to remove the organic compounds from the nucleating sites to thereby permit more efficient subsequent chemical vapor deposition of conductive elements.