HELIOS

Welcome to the Brand page for “HELIOS”, which is offered here for Machines, apparatus and instrument for manufacturing semi-conductors and/or semi-conductor substrates, and/or semi-conductor wafer/chip processing, thermal reactors, expitaxial reactors, quick-heating apparatus, and systems composed thereof for expitaxial layer deposition and/or for thermal treatment of non-semi-conductor substrates, semiconductor substrates, silicon discs and wafers;installation and maintenance of machines, apparatus and instruments, and systems composed thereof, for expitaxial layer deposition and/or thermal treatment of substrates, semi-conductor substrates, silicon discs and wafers for semi-conductor chip manufacturing;helios;the english translation of the greek word helios is sun.;[ development of machines, apparatus and instruments, and systems composed thereof, for expitaxial layer deposition and/or thermal treatment of substrates, semi-conductor substrates, silicon discs and wafers for semi-conductor chip manufacturing ];.

Its status is currently believed to be active. Its class is unavailable. “HELIOS” is believed to be currently owned by “Mattson Thermal Products GmbH”.

Owner:
MATTSON THERMAL PRODUCTS GMBH
Owner Details
Description:
Machines, apparatus and instrument for manufacturing semi-conductors and/or semi-conductor substrates, and/or semi-conductor wafer/chip processing, thermal reactors, expitaxial reactors, quick-heating apparatus, and systems composed thereof for expitaxial layer deposition and/or for thermal treatment of non-semi-conductor substrates, semiconductor substrates, silicon discs and wafers;installation and maintenance of machines, apparatus and instruments, and systems composed thereof, for expitaxial layer deposition and/or thermal treatment of substrates, semi-conductor substrates, silicon discs and wafers for semi-conductor chip manufacturing;HELIOS;The English translation of the Greek word HELIOS is sun.;[ Development of machines, apparatus and instruments, and systems composed thereof, for expitaxial layer deposition and/or thermal treatment of substrates, semi-conductor substrates, silicon discs and wafers for semi-conductor chip manufacturing ];
Categories: MACHINES