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SILVER PLATE or SILVER PLATES
Brand Owner (click to sort)
ACACIA AKASYA KUYUMCULUK VE TURIZM DIS TICARETLIMITED SIRKETI
ASPINAL Burton, Iain Dore
ATASAY ATASAY KUYUMCULUK SANAYI VE TICARET ANONIM SIRKETI
FAUCHON FAUCHON S.A.
FC F.LLI CALEGARO DI LUIGI DI FRANCESCO CALEGARO S.P.A.
FMT TOPAZIO Ferreira Marques & Irmao, Lda.
KIRK NORFOLK INVESTMENT COMPANY
PREVIOUSLY LOVED Susan Eisen, Inc.
TRANQUILITY BACCARAT
Technical Examples
  1. A photothermographic material containing, on a substrate, at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent and a binder in which the total silver iodide content of the photosensitive silver halide is 40 mol % or more and 100 mol % or less, and the coating amount of the photosensitive silver halide, in terms of an amount of silver, is 0.0005 g/m
  2. A silver halide photographic material, including a support having thereon a silver halide emulsion layer, the silver halide emulsion layer containing silver halide particles having a silver chloride content of more than or equal to 90 mol %, wherein a compound represented by Formula (S) is contained in the interior and on a surface of the silver halide particles and in a binder of the silver halide emulsion layer, and the silver halide particles have more than two silver halide phases therein having different concentration of the compound represented by Formula (S):
  3. A photocurable silver composition is provided which comprises an ultraviolet light curable organic mixture, a photoinitiator, a silver powder, and a silver flake composition. The silver flake composition comprises at least 20% of the weight of the silver powder. The disclosed compositions may be used to produce silver-containing coatings on a variety of different substrates. Related methods are provided.
  4. A layered wiring line of silver or silver alloy includes a silver or silver alloy conductor layer including silver or silver alloy; and a protective conductor layer layered on and covering the silver or silver alloy conductor layer. A method for forming the layered wiring line includes steps of: layering the silver or silver alloy conductor layer and the protective conductor layer on a substrate in turn; making the protective conductor layer in contact with a liquid etchant common to the silver or silver alloy conductor layer and the protective conductor layer by a predetermined pattern. The protective conductor layer has a thickness satisfying a relationship in that a ratio of (the protective conductor layer's thickness)/(the silver or silver alloy conductor layer's thickness) is less than that of (a solution velocity of the protective conductor layer in the liquid etchant)/(a solution velocity of the silver or silver alloy conductor layer in the liquid etchant).
  5. A method for controlling silver doping of a chalcogenide glass in a resistance variable memory element is disclosed herein. The method includes forming a silver layer over a chalcogenide glass layer. Processing the silver layer via heat treating, light irradiation, or a combination of both to form a layer comprising silver interstitially formed in a chalcogenide glass layer; silver-selenide formed in a layer comprising silver interstitially formed in a chalcogenide glass layer; or a silver doped chalcogenide glass layer having silver-selenide formed therein.

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