RESIST STRIPPING PREPARATIONS CONTAINING HYDROGEN

Brand Owner Address Description
BLU-ELM MITSUBISHI GAS CHEMICAL COMPANY, INC. 5-2, Marunouchi 2-Chome Chiyoda-ku, Tokyo 100-8324 Japan Resist stripping preparations containing hydrogen peroxide for semiconductor integrated circuits; cleaning preparations used for the removal of polymer and resist from semiconductor integrated circuits; cleaning preparations used for the removal of sidewall polymer from semiconductor integrated circuits;BLUE-ELM;Color is not claimed as a feature of the mark.;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. The present invention pertains to methods for removing unwanted material from a work piece. More specifically, the invention pertains to stripping photo-resist material and removing etch-related residues from a semiconductor wafer during semiconductor manufacturing. Methods involve implementing a hydrogen plasma operation with downstream mixing with an inert gas. The invention is effective at stripping photo-resist and removing residues from low-k dielectric material used in Damascene devices.