PHOTO LITHOGRAPHIC MASKS

Brand Owner (click to sort) Address Description
T Tau Laboratories, Inc. Poughkeepsie NY 12603 Photo Lithographic Masks, Optical Lens Covers and Pellicles Used in the Manufacture of Integrated Circuits and Other Semi-Conductor Devices;TAU;The lining and/or stippling shown in the mark on the drawing is a feature of the mark and does not indicate color.;
TAU Tau Laboratories, Inc. Poughkeepsie NY 12603 Photo Lithographic Masks, Optical Lens Covers and Pellicles Used in the Manufacture of Integrated Circuits and Other Semi-Conductor Devices;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. A method of digital creation of a multivision filter effect. The method includes the steps of initializing a plurality of layers and masks corresponding to the layers, wherein the layers and masks have the same dimensions as a picture, and each of the layers has pixel information of the picture, translating the layers and masks to positions determined according to user input, determining pixel values of each of the masks according to the positions thereof, and merging the layers to which the corresponding masks are applied.